by weissblaumedia | Oct 11, 2024
Home Search results for: Anti-charging Material for Electron Beam Lithography ; About the product ; Mertis ; Usage example ; Others About the product A material for forming a removable polymer conductive film on the surface of semiconductor wafers or glass. The...
by weissblaumedia | Oct 11, 2024
Home Search results for: Cu and Barrier Metal Polishing Colloidal Silica Slurry ; About the product ; Mertis About the product HS-T series is suitable for polishing films containing Cu, barrier metal, and SiO2 films, typically used for interconnect fabrication...
by weissblaumedia | Oct 11, 2024
Home Search results for: Ultra-low Defect Nano Ceria Slurry ; About the product ; Mertis About the product HS-1 series selectively removes SiO2 over other stopper films, making the slurry useful for STI process. Our unique nano ceria abrasive has small particle size...
by weissblaumedia | Oct 11, 2024
Home Search results for: High Removal Rate Ceria Slurry ; About the product ; Mertis About the product HS-0 series efficiently removes high step-height oxide pattern, typically used for memory manufacturing process. These slurries combine our tailor-made abrasive with...
by weissblaumedia | Oct 11, 2024
Home Search results for: Functional High-Purity Solvent ; About the product ; Mertis ; Product line-up ; CLP information About the product Resonac’s solvent for washing off residual resist, wax or flux in the manufacturing processes of semiconductors, LCDs, and...
