HM Series for Thick Resist Layer
Photosensitive Dry Film “PHOTEC”
About the product
RD series are fully aqueous applicable photosensitive films used for direct imaging system. These series have high photosensitivity, high resolution, excellent imaging property and other advantages than conventional films.
Features
- RD-3000 series have excellent adhesion and resolution, make it suitable for fine pattern manufacturing by plating.
- It is used for digital light processing (DLP) system and UV laser direct imaging (UV-LDI) system both.
- Because of high imaging property, it is able to confirm the exposed area.
(In house evaluation data)
| Items | Units | RD-3015 | RD-3019 | RD-3025 |
|---|---|---|---|---|
| Thickness of resist | µm | 15 | 19 | 25 |
| Exposure energy | mJ/cm2 | 95 | 95 | 85 |
| Recommended step held | x/41ST | 15 | 15 | 15 |
| Adhesion (L/S=x/3x) | µm | 4 | 5 | 7 |
| Resolution (L/S=x/x) | µm | 4 | 5 | 7 |
- DE-1 UH was applied(Adtec Engineering Co.,Ltd, 405 nmDI)
Substrate roughness Ra:0.4 µm
Post exposure bake (P.E.B) : 80 degree C, 30 Sec. (Box Oven)
Developer : 1.0 wt% Na2CO3aq., 30 degree C, 0.16 MPa
RD-3015 (L/S=4 µm /4 µm)
RD-3019 (L/S=5 µm/5 µm)
RD-3025 (L/S=7 µm/7 µm)
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