HM Series for Thick Resist Layer
Photosensitive Dry Film “PHOTEC”
About the product
HM series are photosensitive films to form a thick resist layer with higher aspect ratio.
They are used for electro-forming such as metal mask.
Features
- Excellent resolution and adhesion make it possible to form a resist with higher aspect ratio.
- Thickness lineup according to the application (thickness; 35～200 µm, available upon request)
- Smooth sidewall of plating line due to the smooth resist profile.
(In house evaluation data)
| Items | Units | HM-4000series (For Contact Exposure) |
||
|---|---|---|---|---|
| HM-4056 | HM-4075 | |||
| Thickness of resist | µm | 56 | 75 | |
| Exposure energy | mJ/cm2 | 85 | 130 | |
| Extra high pressure mercury lamp*1 | ||||
| Adhesion(L/S=x/400) | µm | 22 | 35 | |
| Resolution(L/S=x/x) | µm | 25 | 35 | |
※1 Collimated light type
HM-4056
Resist thickness：56 µm
Φ=30 µm
HM-40112
Resist thickness：112 µm
L/S=180 µm/30 µm
HM-40112
Resist thickness：112 µm
Resist diameter:Φ=30 µm (Space：40 µm)
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