High-Purity Hydrogen Fluoride (HF)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching oxide films and chosen for etching natural oxide films on the surface of silicon.
Merits
- A stable supply structure supported by a strong supply chain.
- Stable product quality with the technique for packaging corrosive gas.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance / colorless gas or liquid | Odor / pungent odor |
| CAS NO / 7664-39-3 | UN number / 1052 |
| Incombustible, corrosive gas | Toxic |
※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of HF
| Item | Data |
|---|---|
| Physical state | Liquid |
| Appearance | Liquid |
| Color | Colorless |
| Odor | Strong pungent odor |
| Odor threshold (ppm) | 0.042ppm |
| pH | Strong acid (pH of the 2% solution is 1 or lower) |
| Melting point | -83.53 ℃ |
| Boiling point | 19.51 ℃ |
| Vapor pressure | 103.3 kPa (20℃) |
| Relative vapor density (20℃) | 0.69 (air = 1, calculation value) |
| Relative density | 0.987 (20℃) |
CLP information
| Acute Tox. 2, H300 | Acute Tox. 1, H310 |
| Acute Tox. 2, H330 | Skin Corr. 1A, H314 |
| Eye Dam. 1, H318 | – |
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