High-Purity Electronic-Grade Solvents
About the product
Resonac provides a wide range of high-purity solvents for semiconductor manufacturing processes.
The products serve various purposes, and are used for washing and rinsing and as a photoresist solvent.
Merits
- Available in various packaging modes from gallon bottles and canisters to ISO containers.
- Accommodates the need for mixed solvents containing multiple organic solvents with specific compositions.
- Guarantee is offered for the mother liquid (product tanks), filling aperture, and packaging mode (packaging of filled containers).
- Solvents not in the list can also be provided with high purity in small amounts for laboratory use (test reagents) or pilot studies.
Product line-up
Category | Product name | Compound name | CAS, product composition | Usage |
---|---|---|---|---|
Carbon hydride | Toluene | Toluene | 108-88-3 | – |
Xylene | Xylene | 1330-20-7 | – | |
Alcohol | Methanol | Methanol | 67-56-1 | – |
IPA | Isopropyl alcohol | 67-63-0 | – | |
MIBC | 4-Methyl-2-pentanol | 108-11-2 | – | |
Ketone | Acetone | 2-propanone | 67-64-1 | – |
MEK | Methyl ethyl ketone | 78-93-3 | – | |
MIBK | Methyl isobutyl ketone | 108-10-1 | – | |
Cyclohexanone | Cyclohexanone | 108-94-1 | – | |
Ether | Diethyl ether | Diethyl ether | 60-29-7 | – |
Dibutyl ether | Dibutyl ether | 142-96-1 | – | |
Cyclic ether | THF | Tetrahydrofuran | 109-99-9 | – |
1,4-Dioxane | 1,4-Dioxane | 123-91-1 | – | |
Glycol ether | PGME | Propylene glycol monomethyl ether | 107-98-2 | – |
PGMEA | Propylene glycol monomethyl ether acetate | 108-65-6 | – | |
Ester | Ethyl acetate | Ethyl acetate | 141-78-6 | – |
SOLFAINE-BA | Butyl acetate | 123-86-4 | – | |
Ethyl lactate | Ethyl lactate | 687-47-8 | – | |
Amide | N,N-Dimethylformamide | N,N-Dimethylformamide | 68-12-2 | – |
Dimethylacetamide | Dimethylacetamide | 127-19-5 | – | |
Other | DMSO | Dimethyl sulfoxide | 67-68-5 | – |
γ-Butyrolactone | γ-Butyrolactone | 96-48-0 | – | |
NMP | N-Methyl-2-pyrrolidone | 872-50-4 | – | |
Mixed solvent | SOLFINE-Rinse PX-1 | Mixture of ester and glycol solvents | – | Thinner for semiconductor photoresist, edge/back rinsing solvent for lithography |
SOLFINE-Rinse PX-7 | Mixture of PGME and PGMEA solvents | – | Edge/back rinsing solvent for semiconductor lithography, liquid crystal substrates, etc. | |
SOLFINE-Stripper 715D | – | – | Stripping solvent to remove altered resist films (sidewall polymers) formed in the dry etching process of semiconductor photolithography. Also used for washing the parts of etching equipment. |
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