Resonac Europe

High-Purity Electronic-Grade Solvents

About the product

Resonac provides a wide range of high-purity solvents for semiconductor manufacturing processes.
The products serve various purposes, and are used for washing and rinsing and as a photoresist solvent.

Merits

  • Available in various packaging modes from gallon bottles and canisters to ISO containers.
  • Accommodates the need for mixed solvents containing multiple organic solvents with specific compositions.
  • Guarantee is offered for the mother liquid (product tanks), filling aperture, and packaging mode (packaging of filled containers).
  • Solvents not in the list can also be provided with high purity in small amounts for laboratory use (test reagents) or pilot studies.

Product line-up

Category Product name Compound name CAS, product composition Usage
Carbon hydride Toluene Toluene 108-88-3
Xylene Xylene 1330-20-7
Alcohol Methanol Methanol 67-56-1
IPA Isopropyl alcohol 67-63-0
MIBC 4-Methyl-2-pentanol 108-11-2
Ketone Acetone 2-propanone 67-64-1
MEK Methyl ethyl ketone 78-93-3
MIBK Methyl isobutyl ketone 108-10-1
Cyclohexanone Cyclohexanone 108-94-1
Ether Diethyl ether Diethyl ether 60-29-7
Dibutyl ether Dibutyl ether 142-96-1
Cyclic ether THF Tetrahydrofuran 109-99-9
1,4-Dioxane 1,4-Dioxane 123-91-1
Glycol ether PGME Propylene glycol monomethyl ether 107-98-2
PGMEA Propylene glycol monomethyl ether acetate 108-65-6
Ester Ethyl acetate Ethyl acetate 141-78-6
SOLFAINE-BA Butyl acetate 123-86-4
Ethyl lactate Ethyl lactate 687-47-8
Amide N,N-Dimethylformamide N,N-Dimethylformamide 68-12-2
Dimethylacetamide Dimethylacetamide 127-19-5
Other DMSO Dimethyl sulfoxide 67-68-5
γ-Butyrolactone γ-Butyrolactone 96-48-0
NMP N-Methyl-2-pyrrolidone 872-50-4
Mixed solvent SOLFINE-Rinse PX-1 Mixture of ester and glycol solvents Thinner for semiconductor photoresist, edge/back rinsing solvent for lithography
SOLFINE-Rinse PX-7 Mixture of PGME and PGMEA solvents Edge/back rinsing solvent for semiconductor lithography, liquid crystal substrates, etc.
SOLFINE-Stripper 715D Stripping solvent to remove altered resist films (sidewall polymers) formed in the dry etching process of semiconductor photolithography. Also used for washing the parts of etching equipment.

Inquirer about product


Subscribe Newsletter


Please subscribe our technology eNewsletter!

Inquiry about product

Please inquire about product, technology or samples from here.