High-Purity Hydrogen Chloride (HCl)
About the product
Resonac’s gas used for forming conductor film in semiconductor manufacturing is particularly suitable for the deposition of silicon films and chosen for forming silicon channel films as well as cleaning.
Merits
- A stable supply structure supported by a strong supply chain.
- Stable product quality with the technique for packaging corrosive gas.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance / colorless gas or liquid | Odor / pungent odor |
| CAS NO / 7647-01-0 | UN number / 1050 |
| High-pressure gas, liquefied gas | Toxic, corrosive |
※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of CH３F
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Liquefied gas |
| Color | Colorless |
| Odor | Pungent odor |
| pH | 0.1 (1.0N) 1.10 (0.1N) 2.02 (0.01N) 3.02 (0.001N) 4.01 (0.0001N) |
| Melting point | -114.22℃ |
| Boiling point | -85.05℃ (1013 hPa) |
| Flash point | Incombustible |
| Critical temperature | 51.49 ℃ |
| Autoignition point | Incombustible |
| Vapor pressure | 35424 mm Hg (25℃) |
| Critical pressure | 81.6 atm |
| Relative density | 1.268 (air = 1) |
| Density | 1.639 g/cm³ (0℃) |
| Explosive limits (upper, lower) (g/m³) | Not applicable (incombustible) |
CLP information
| Press. Gas (Comp.), H280 | Acute Tox. 3, H331 |
| Skin Corr. 1A, H314 | Eye Dam. 1, H318 |
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